Multibeam launches chip industry's 1st multicolumn E-Beam lithography
What is the MB platform introduced by Multibeam Corp?
The MB platform introduced by Multibeam Corp is a first-of-a-kind Multicolumn E-Beam Lithography (MEBL) system built for mass production2. It is a fully automated precision-patterning technology used for rapid prototyping, advanced packaging, high-mix production, chip ID, compound semiconductors, and other applications2. The platform revolutionizes e-beam lithography with new productivity advantages, enabling high resolution, fine features, wide field of view, and large depth of focus.
How does the MB platform improve chip manufacturing productivity?
The MB platform improves chip manufacturing productivity by revolutionizing e-beam lithography (EBL) with new productivity advantages, enabling high resolution, fine features, wide field of view, and large depth of focus. The platform's novel architecture employs multiple miniature columns that operate individually and in parallel, with an advanced control system directing the beams to achieve maximum accuracy, quality, and speed. This results in a throughput more than 100 times greater than conventional EBL systems.
What sizes of wafers can the MB platform accommodate?
The MB platform can accommodate 150mm, 200mm, and 300mm wafer sizes. This flexibility allows for a wide range of applications and caters to different manufacturing needs in the semiconductor industry.